SubtractBackgroundTask#
- class lsst.meas.algorithms.SubtractBackgroundTask(config=None, *, name=None, parentTask=None, log=None)#
Bases:
TaskSubtract the background from an exposure
Methods Summary
fitBackground(maskedImage[, nx, ny, algorithm])Estimate the background of a masked image
run(exposure[, background, stats, ...])Fit and subtract the background of an exposure.
Methods Documentation
- fitBackground(maskedImage, nx=0, ny=0, algorithm=None)#
Estimate the background of a masked image
Parameters#
- maskedImage
lsst.afw.image.maskedImage Masked image whose background is to be computed
- nx‘int`
Number of x bands; if 0 compute from width and
self.config.binSizeX- ny
int Number of y bands; if 0 compute from height and
self.config.binSizeY- algorithm
str Name of interpolation algorithm; if None use
self.config.algorithm
Returns#
- bg
lsst.afw.math.Background A fit background
Raises#
- RuntimeError
Raised if lsst.afw.math.makeBackground returns None, an indicator of failure.
- maskedImage
- run(exposure, background=None, stats=True, statsKeys=None, backgroundToPhotometricRatio=None)#
Fit and subtract the background of an exposure.
Parameters#
- exposure
lsst.afw.image.Exposure Exposure whose background is to be subtracted.
- background
lsst.afw.math.BackgroundList Initial background model already subtracted. May be None if no background has been subtracted.
- stats
bool If True then measure the mean and variance of the full background model and record the results in the exposure’s metadata.
- statsKeys
tuple Key names used to store the mean and variance of the background in the exposure’s metadata (another tuple); if None then use (“BGMEAN”, “BGVAR”); ignored if stats is false.
- backgroundToPhotometricRatio
lsst.afw.image.Image, optional Image to multiply a photometrically-flattened image by to obtain a background-flattened image. Only used if config.doApplyFlatBackgroundRatio = True.
Returns#
- background
lsst.afw.math.BackgroundList Full background model (initial model with changes), contained in an
lsst.pipe.base.Struct.
- exposure